FESEM
MACHINE FEATURES |
|
Constructor |
TESCAN |
Model |
MIRA3 XMH |
Electron gun |
High Brightness Schottky Emitter |
Resolution in high vacuum mode |
- In beam SE: 1,0 nm @30 keV - 1,2 nm @15keV - 3,5 nm @1 keV - In chamber SE: 1,2 nm @30 keV - 1,5 nm @15keV - 4,5 nm @1 keV |
Magnifiction |
1X - 1000000X |
Field of view |
6.4 mm at WDanalytical* 10 mm, 20 mm at WDanalytical 30 mm |
Accelerating / landing voltage |
0,2 kV to 30 kV |
Probe current |
2 pA to 200 nA |
Scanning speed |
From 20 ns to 10 ms per pixel adjustable in steps or continuously |
Vacuum system |
- High vacuum in chamber: <9 x10-3 Pa - Gun vacuum: <3 x10-7 Pa |
Chamber specifications |
- Internal size: 290 mm (width) × 340 mm (depth) - Door: 290 mm (width) × 322 mm (height) - Number of ports: 12+ - Pneumatic vibration isolation system |
Specimen stage |
- Moviments: 5-axis fully motorized - Type: compucentric - Minimum step: 100 nm - Max. height of specimen: 106 mm with rotation stage, 147 mm without rotation stage - Max. weight: 8 kg |
Dectectors |
- Secondary Electrons (SE) - Back Scattered Electrons (BSE) - In beam SE |
Microanalysis |
EDX, EBSD |
* Work Distance